Ceramic Plate and Ring for Polishing

Product Features
1. High flateness and parallelism 
2. Compact and uniform micro-structure
3. High strength and high wear resistance
4. Non-pollution of metallic ion 
5. less deformation
Product Description
We could supply customers ceramic holder for CMP polishing with various outer diameter and thickness. This kind of table could be used for CMP polishing of  2, 3, 4, 5, 6 inch wafer. They are up to the level of imported products. Spare parts of Ceramic plates and ring for polishing can be made according to customers’ requirement.

1) Model specification and the precision for ceramic plate

2) Model specification and the precision for ceramic ring

Note:Other specification can be produced according to customer’s requirement

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